Semiconductor - Example 3
The ”purest” UPW measured with LC-OCD (2003)
TOC of polishing loop was 1310 ppt.
930 ppt was related to a leaching product (L2) and 380 ppt to urea.
NOM was fully absent (elutes between 25 - 50 min).
The water was fed to an additional RO-unit.
L2 was fully removed, urea in part.
TOC of this product water was only 0.077 ppb or 77 ppt.
The purest water we have measured to date. (duplicate measurements).